Interface and Surface Science Laboratory

Lab Equipment

Major Systems Available in Our Lab

UHV System 1

UHV System 1

-System 1

  • Auger Electron Spectroscopy ()
  • Low Energy Electron Diffraction ()
  • Temperature Programmed Desorption ()

UHV System 2

UHV System 2

UHV System 2

Low Energy Electron Diffraction

Low Energy Electron Diffraction (LEED)

(High Temperature) Scanning Tunneling Microscopy ()

UHV System 3

UHV System 3

UHV System 3

Laser Molecular Epitaxy

Reflection high energy electron diffraction

Reflection high energy electron diffraction ()

  • X-Ray photoemission spectroscopy ()
  • X-ray photo electron diffraction (XPD)

UHV System 4

  • Room temperature scanning tunneling microscopy (STM)
  • Photoemission electron microscopy ()
  • X-ray photoemission spectroscopy (XPS) (in planning)
  • Preparation chamber with and low energy electron diffraction (LEED) (in planning)

Non-Vacuum Systems

Dual-zone for graphene and oxide nanomaterials synthesis

Atomic Force Microscope

Photocatalyst testing station

testing station 

( and for photocatalytic organic dye decompostion)